BTU International to debut TRITAN HV90 Metallization Firing System at PV Taiwan 2011

Written by  Dan Comand October 20, 2011
BTU International introduces the TRITAN HV90 metallization firing system for silicon photovoltaics.  
The TRITAN HV90 dual-lane metallization firing system features increased throughput at 3600 wafers per hour, an edge belt, volatile organic compound (VOC) abatement and a single zone spike with less than 3 seconds spike time.  

“The HV90 is a dual-lane firing furnace that is optimized for volume production,” said Bob Bouchard, product marketing manager for metallization products at BTU.  “Dual-lane processing is a tremendous leap forward in the race to lower cost per watt.  Customers switching to dual-lane can expect a 35 percent increase in capital efficiency and with the TRITAN HV90’s unparalleled performance in lane to lane matching, there is really no reason to wait,” added Bouchard.  

The TRITAN metallization firing system features BTU’s unique TriSpeed technology, allowing  users to take advantage of superior ramp rates — up to 200ºC per second — while not compromising the drying and cooling sections of the profile. The three-belt, three-speed system provides revolutionary control of profile development. In trials, TRITAN has consistently shown an improvement in fill factor resulting in increased efficiency. This, combined with TRITAN’s low cost of ownership, enables customers to achieve the lowest cost per watt.

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